HST TITANIUM specializes in the production of high purity () titanium nitride sputtering targets with the highest possible density. Titanium Nitride Sputtering Target and smallest possible average grain sizes for use in semiconductor, chemical vapor deposition (CVD) and physical vapor deposition (PVD) display and optical applications.
Our standard Sputtering Targets for thin film are available monoblock or bonded with planar target dimensions and configurations up to 820 mm with hole drill locations and threading, beveling, grooves and backing designed to work with both older sputtering devices as well as the latest process equipment, such as large-area coating for solar energy or fuel cells and flip-chip applications.
